TKF 4 Simple Bilateral Automatic Switching Pressure Reducing Valve Group is organized for buyers comparing Centralized Gas Supply Switching Series for high purity gas supply, semiconductor process gas systems, laboratory gas panels, cylinder cabinets, and industrial fluid control projects. Review the existing product details and images below, then compare related Kuzu fluid equipment for compatible sourcing options.
Simple bilateral automatic switching pressure reducing valve group TKF-4 Structural characteristics:
Adopting a two-stage pressure reducer
Diaphragm valve knob with switch indicator window
Optional safety valve configuration
Expandability can be achieved through the use of manifold fittings
Adopting wall mounted installation
Optional pressure alarm device
Optional detachable pressure gauge
Simple bilateral automatic switching pressure reducing valve group TKF-4 Technical Parameter:
Input Pressure Max: 3000PSI
Output Pressure Outlet Pressure: 0-25 PSI, 0-50 PSI,
0-100psig,0-250psig
Proof Pressure: 1.5 times the input pressure for safety testing
Operating temperature:- 40C~+100C
Leakage rate of pressure regulator: 2x10 atm cc/sec He
CV:0.08
Related Products TKF 6 Bilateral Manual Switching Valve Group for Gas Supply Systems TKF 3 Single Side Gas Supply Valve Group for Cylinder Stations TKF 2 Bilateral Automatic Switching Pressure Reducing Valve Group
Visit our website Reducing Valve Series. Explore industrial-grade regulators for laboratories, gas pipelines, and high-purity systems. Specifications and certifications are downloadable.
Yes. Navigate to Gas Supply Switching Series on our website. Discover automated switch panels, manifolds, and safety-integrated systems compliant with ISO 13485 for labs/medical facilities.
Provide the IP protection rating, maximum static load capacity for cylinder racks, and certified explosion-proof zone classifications (e.g., ATEX/IECEx Zone 1). Specify material compatibility for corrosive gases (e.g., Cl₂, NH₃). Usage Scenarios: Hazardous environments like chemical labs, industrial gas storage, or semiconductor fabs requiring leak containment and ignition source isolation.
Detail the pressure regulation accuracy (e.g., ±0.5% FS), inlet/outlet pressure ranges (bar), and flow capacity (Nm³/h). Clarify compliance with ISO 2503 for medical/lab gas systems. Usage Scenarios: Precision gas control in HPLC instruments, laser cutting machines, or biopharma reactors requiring stable pressure amid flow fluctuations.
State the particle retention rating (µm) for VCR diaphragm valves, maximum cycling frequency (cycles/min), and permissible fluid viscosity (cP). Include temperature/pressure curve data for steam-cleaned assemblies. Usage Scenarios: Ultra-high-purity gas/liquid handling in semiconductor wafer processing, vaccine production, or nuclear facilities demanding zero contamination.
